Use of Supramolecular Assemblies as Lithographic Resists

Research output: Contribution to journalArticle

  • External authors:
  • Scott Lewis
  • Antonio Fernandez Mato
  • Guy A DeRose
  • M Hunt
  • George Whitehead
  • Agnese Lagzda
  • Hayden Alty
  • Jesus Ferrando Soria
  • Sarah Varey
  • Andreas Kostopoulos
  • F Schedin
  • Christopher Muryn
  • Grigore Timco
  • Axel Scherer
  • Richard Winpenny

Abstract

We show that by design we can create a new resist materials for electron beam lithography, based on a supramolecular assembly. The initial studies show that via this supramolecular approach high resolution structures can be written which show
unprecedented selectivity when exposed to etch conditions involving plasmas.

Bibliographical metadata

Original languageEnglish
JournalAngewandte Chemie - International Edition
Volume56
Issue number24
Early online date15 May 2017
DOIs
StatePublished - 2017