Methods of manufacturing a graphene-based device

Research output: Patent

  • Authors:
  • Migliorato Max (Inventor)
  • Kumar Rakesh (Inventor)
  • Monteverde Umberto (Inventor)

Abstract

A method of manufacturing a graphene-based device, comprising (i) providing a graphene assembly comprising one or more layers of graphene 32, a first photoresist layer (ref 34, fig 15) disposed on the one or more layers of graphene, and an ultra-violet (UV) barrier layer (36) disposed on the photoresist layer on an opposite side to the one or more layers of graphene; (ii) transferring the graphene assembly onto a substrate 44 comprising at least one cavity 44a so that the one or more layers of graphene traverse the at least one cavity; (iii) using photolithography to expose portions of the one or more layers of graphene on opposite sides of the at least one cavity;(iv) forming conductive contacts 56 over the exposed portions of graphene; (v) removing the UV barrier layer; and (vi) removing the first photoresist layer. The device may be a gas sensor.

Bibliographical metadata

Original languageEnglish
Patent numberGB2574412
IPCG01N 27/ 12 A I
Priority date5/06/18
Publication statusPublished - 11 Dec 2019