Anodic dissolution growth of metal-organic framework HKUST-1 monitored via in situ electrochemical atomic force microscopyCitation formats

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Anodic dissolution growth of metal-organic framework HKUST-1 monitored via in situ electrochemical atomic force microscopy. / Worrall, Stephen D.; Bissett, Mark A.; Attfield, Martin P.; Dryfe, Robert A.W.

In: CrystEngComm, Vol. 20, No. 31, 2018, p. 4421-4427.

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@article{b907dbf26f7549e196c64c8756f0e8eb,
title = "Anodic dissolution growth of metal-organic framework HKUST-1 monitored via in situ electrochemical atomic force microscopy",
abstract = "In situ electrochemical atomic force microscopy (ec-AFM) is utilised for the first time to probe the initial stages of metal-organic framework (MOF) coating growth via anodic dissolution. Using the example of the Cu MOF HKUST-1, real time surface analysis is obtained that supports and verifies many of the reaction steps in a previously proposed mechanism for this type of coating growth. No evidence is observed however for the presence or formation of Cu2O, which has previously been suggested to be both key for the formation of the coating and a potential explanation for the anomalously high adhesion strength of coatings obtained via this methodology. Supporting in situ electrochemical Raman spectroscopy also fails to detect the presence of any significant amount of Cu2O before or during the coating's growth process.",
author = "Worrall, {Stephen D.} and Bissett, {Mark A.} and Attfield, {Martin P.} and Dryfe, {Robert A.W.}",
year = "2018",
doi = "10.1039/c8ce00761f",
language = "English",
volume = "20",
pages = "4421--4427",
journal = "CrystEngComm",
issn = "1466-8033",
publisher = "Royal Society of Chemistry",
number = "31",

}

RIS

TY - JOUR

T1 - Anodic dissolution growth of metal-organic framework HKUST-1 monitored via in situ electrochemical atomic force microscopy

AU - Worrall, Stephen D.

AU - Bissett, Mark A.

AU - Attfield, Martin P.

AU - Dryfe, Robert A.W.

PY - 2018

Y1 - 2018

N2 - In situ electrochemical atomic force microscopy (ec-AFM) is utilised for the first time to probe the initial stages of metal-organic framework (MOF) coating growth via anodic dissolution. Using the example of the Cu MOF HKUST-1, real time surface analysis is obtained that supports and verifies many of the reaction steps in a previously proposed mechanism for this type of coating growth. No evidence is observed however for the presence or formation of Cu2O, which has previously been suggested to be both key for the formation of the coating and a potential explanation for the anomalously high adhesion strength of coatings obtained via this methodology. Supporting in situ electrochemical Raman spectroscopy also fails to detect the presence of any significant amount of Cu2O before or during the coating's growth process.

AB - In situ electrochemical atomic force microscopy (ec-AFM) is utilised for the first time to probe the initial stages of metal-organic framework (MOF) coating growth via anodic dissolution. Using the example of the Cu MOF HKUST-1, real time surface analysis is obtained that supports and verifies many of the reaction steps in a previously proposed mechanism for this type of coating growth. No evidence is observed however for the presence or formation of Cu2O, which has previously been suggested to be both key for the formation of the coating and a potential explanation for the anomalously high adhesion strength of coatings obtained via this methodology. Supporting in situ electrochemical Raman spectroscopy also fails to detect the presence of any significant amount of Cu2O before or during the coating's growth process.

U2 - 10.1039/c8ce00761f

DO - 10.1039/c8ce00761f

M3 - Article

AN - SCOPUS:85051171244

VL - 20

SP - 4421

EP - 4427

JO - CrystEngComm

JF - CrystEngComm

SN - 1466-8033

IS - 31

ER -